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Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101
Figure 1: SEM images demonstrating the effect of substrate on the single-spot overexposure of a ring at a dos...
Figure 2: Single-spot overexposure of a ring dependening on the substrate type: (a) a single-crystal Si subst...
Figure 3: Effect of the exposure dose and substrate material on the single-spot pattern formation: (a) the ri...
Figure 4: (a,c) Monte Carlo simulation of 250 electron scattering trajectories at 10 keV incident energy in a...
Figure 5: AFM images of the ring, patterned on the silicon substrate coated by a 120 nm thick PMMA A2 resist:...
Figure 6: Dependence of dout (a) and din (b) on the exposure dose at an acceleration voltage of 10 kV for dif...
Figure 7: SEM images demonstrating the effect of changing the ds between the electron beam spots with a dose ...
Figure 8: Polymer nanostructures fabricated on a PMMA A2 resist of 75 nm thickness at an acceleration voltage...
Figure 9: Effect of the acceleration voltage on the formation of polygons on Si (a–c) and Au (d–f) substrates...
Figure 10: (a,b) Electron energy distribution in a 75 nm thick PMMA layer on a bulk Si substrate at 15 and 20 ...
Figure 11: 3D AFM images of polymer nanostructures fabricated on PMMA A2 resist with thickness of 75 nm on Si ...
Figure 12: Demonstration of the proximity effect using nanostructures fabricated on a PMMA A2 resist with a th...
Figure 13: An example of a complex polymer pattern with a minimum line width of 15 nm fabricated at an acceler...
Figure 14: SEM images of Co nanostructures formed on the pre-patterned Si substrate: (a) circle, (b) double ci...